Ion Implant

Ion implantation is a process by which ions of one element are accelerated into a solid target, thereby changing the physical, chemical, or electrical properties of the target. This process involves the use of toxic materials and the residue of hazardous elements must be periodically removed from components used in the semiconductor fabrication process to assure proper functioning. 

IND has developed an in-depth understanding of the challenges this process presents to the continual proper functioning of our client’s equipment.  This knowledge and the Company’s extensive experience allow us to provide the level of service and support needed to keep our client’s equipment properly working.  

This support is provided through Field Services as well as an in-house cleaning department.   The in-house cleaning department is rigorously segregated from other operations to ensure there is no cross-contamination.  In addition, IND ensures consistent premiere quality processing through its documented absolute compliance with stringent ISO standards. IND provides a door-to-door service as requested by its customers.

IND’s Ion implant services include:

  • Disassembly
  • Decontamination
  • Cleaning to semiconductor standards
  • Consumable sourcing / stocking / replacement
  • Assembly
  • Function testing / Leak checking
  • Cleanroom Packaging
  • Custom transport packaging options
  • Delivery

These services are provided for many fabrication parts including:

  • Sources (various types)
  • Extractions
  • Beamgates
  • Flight tubes
  • Graphite cleaning
  • Other arsenic-contaminated materials